| System Type |
EBSD analysis system for SEM |
Complete solution incl. EBSD detector and ESPRIT software |
| Detector Options |
eWARP, eFlash FS, eFlash HD/HR, eFlash 1000 |
eWARP = Direct Electron Detection; eFlash = phosphor + CMOS camera |
| eWARP Sensor |
Pixelated CMOS direct electron detector |
Electrons-only acquisition for maximum signal efficiency |
| eWARP Pattern Rate (EBSD) |
Up to ~14,400 patterns/s |
Ultra-fast high-resolution mapping at 10 kV / 12 nA |
| eWARP FSE/BSE Imaging |
Up to ~350,000 pixels/s (ARGUS) |
1 Mpixel FSE images in ~3 s; 5 images simultaneously (VFSE) |
| eFlash FS Speed |
Up to 945 patterns/s (8×8 binning) |
210 patterns/s at native 640×480 px resolution (FS) |
| eFlash HD/HR Resolution |
Up to 1600 × 1200 pixels |
High-resolution EBSD patterns for advanced materials |
| Screen Positioning |
In-situ vertical screen adjustment under vacuum |
Optimized for simultaneous EBSD & EDS; automatic tilt readout |
| Spatial Resolution (eWARP) |
Typically < 25 nm at 10 kV |
20 nm demonstrated on martensitic steel; 25 nm step size mapping |
| Beam Conditions (eWARP) |
≈10 kV, 12 nA (typical) |
Low kV EBSD as standard; high indexing rates (> 99%) |
| ARGUS Imaging |
FSE/BSE imaging with 4 Si diodes |
Phase, orientation & topography contrast; color-coded images |
| TKD Option |
OPTIMUS 2 on-axis TKD detector head |
Optimized for nanomaterials & thin films; STEM-in-SEM imaging |
| Software Suite |
ESPRIT for EBSD/EDS + ESPRIT QUBE/DynamicS |
Pattern Streaming, Signal Assistant, Calibration Assistant, fast re-indexing |
| Integration |
Full integration with QUANTAX EDS & Micro-XRF |
Simultaneous EBSD/EDS mapping; phase discrimination using EDS |